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Explosion at Intel Plant in Southern Israel Leaves Workers Seriously Injured

(MENAFN) At least three people were seriously injured in an explosion at an Intel semiconductor facility in Kiryat Gat, southern Israel, on Wednesday, according to media reports.

Emergency medical personnel reported that three individuals sustained severe injuries in the incident. Police said “the explosion was suspected to have been caused by the detonation of a gas cylinder,” although the precise cause had not been established.

Israel’s Fire and Rescue Authority warned that hazardous substances may have leaked following the blast. Emergency crews were working to identify the source of the chemicals and put out the fire that followed the explosion.

Reports indicated that nitrogen trifluoride, a gas used in semiconductor production, may have been involved in the incident. Specialized hazardous materials teams were deployed to monitor the site and assess potential risks.

Fire and rescue officials later said firefighters had brought the source of the blaze under control. Earlier, eight firefighting and rescue teams had been sent to the facility, accompanied by specialist hazardous materials units from nearby stations.

Authorities had yet to confirm the cause of the explosion as emergency teams continued their response.

Intel’s facility in Kiryat Gat is involved in semiconductor chip manufacturing, making the incident a significant safety event at an industrial technology site.

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